真空鍍二硫化鉬干膜涂層

鍍層的性質(zhì)：一般厚度大約2.0-3.0 μm；摩擦系數(shù)小于 0.15。（典型為：0.05-0.10間）(against WC/Co ball)；硬度Hp > 1,200kg/mm² ；深灰黑色；劃痕粘接力：大于60N；相對(duì)磨損率：2E-16  m3/Nm (WC-6%Co ball ?5mm, 80 N test    ?8mm track, 477rpm, 200mms-1)。

· MoS2基鍍層一般厚度大于1.0 μm；摩擦系數(shù)約為0.05 到 0.10之間(against WC/Co ball)；在150kgf的洛氏硬度計(jì)壓頭壓入，鍍層不脫落（>HF2），硬度約 950-1050 VHN；深灰色；劃痕粘接力：大于60N；相對(duì)磨損率：2E-16  m3/Nm (WC-6%Co ball ?5mm, 40 N test    ?8mm track, 477rpm, 200mms-1)。

· ?MoST : Properties of coating

CrN 鍍層

CrN: 鍍層硬度Hf>2000HV，鍍層厚度>3微米；結(jié)合力：在150kgf的洛氏硬度計(jì)壓頭壓入，鍍層不脫落（>HF2）； 標(biāo)準(zhǔn)劃痕試驗(yàn)：Lc>60N；鍍層前后的表面粗糙度增加值Ra≤0.01微米，鏡面效果。

CrN coating, the hardness of the coating: Hf>2000Hv, the thickness of the coatings: >3.0um. The adhesion of the coatings: >HF2. And Lc > 60N with Scratch system. The Roughness of the coating Ra<0.01

性能優(yōu)勢(shì)

· Coating deposition carried out using a high density of low energy bombarding ions.

使用高密度低能量轟擊離子進(jìn)行沉積鍍膜。

· Deposition of very dense, non-columnar coating structures with low internal stresses.

鍍層致密度好，低柱狀晶結(jié)構(gòu)，內(nèi)應(yīng)力低

· Deposition of coatings with dense structures at low temperatures.

? 可在低溫環(huán)境下沉積致密結(jié)構(gòu)的鍍層

· High efficiency of ion cleaning resulting in coatings with the highest levels of adhesion.

高效率等離子清理以提供高的鍍層結(jié)合強(qiáng)度。

· Coatings quality is assured by the use of specially designed Plasmag sputter sources, which create an intense plasma and high ion bombardment of work pieces.

鍍層品質(zhì)保證是由使用專門設(shè)計(jì)plasmag濺射源及提供高密度的等離子。   

 離子濺射二硫化鉬，真空鍍二硫化鉬，PVD二硫化鉬，離子束濺射MoS2，耐高溫：350度，